With the rapid development of modern science and technology such as precision machining and manufacturing, microelectronic engineering, optical precision engineering, etc., this has placed higher and higher requirements on precision positioning and processing technology. Not only is it required to have nano-level positioning accuracy, but also needs to be able to achieve large Stroke processing and positioning technology. CoreMorrow develop and design a series of large-stroke multi-dimensional motion platforms for its large travel, high precision, and fast response. It is widely used in precision machining, scanning microscopy and other fields.
XD601.XYZ100
XD601.XYZ100 is 3-dimensional linear motion platform using piezoelectric stacks as the driving source and using amplification mechanism. It is nano positioning system that combines piezoelectric and flexible hinges. It can achieve millisecond response and nano positioning accuracy.
· XYZ motion
· Stroke to X180μm,Y180μm,Z300μm
· Resolution XY2nm,Z4nm
· Load to 200g
XD602
XD602 uses frictionless flexible hinge guide mechanism, built-in high-performance piezoelectric stacks, can achieve 200μm displacement. Finite element simulation analysis is used to optimize the flexible hinge structure. The flexible guidance system has high guidance accuracy and good control accuracy. The resolution and stability can reach the nanometer level, and the positioning stability time is only on the order of milliseconds.
· XYZ motion
· Stroke to 200μm/axis
· Resolution 8nm
· Load to 300g
P15.XYZ300
P15.XYZ300 is fast, high-precision 3-axes scanning and positioning platform with very high straightness. The central through hole is 66*66mm, the stroke is 300μm/axis, and the interior uses a finite element analysis (FEA) optimized wire-cut flexure hinge structure. FEA makes its design as rigid as possible and minimizes linearity and angular run out.
· XYZ motion
· Stroke to 300μm/axis
· Resolution 6nm
· Aperture 66*66mm
· Load to 500g
P18.XYZ200
P18.XYZ200 is 3-dimensional linear scanning stage specially designed for applications that require large aperture and large displacement travel. It can achieve scanning range of 200μm, and the aperture is Ø35mm. It has been widely used in the fields of precise sample positioning, scanning microscopy and interference.
· XYZ motion
· Stroke to 200μm/axis
· Resolution 5nm
· Aperture Ø35mm
· Load to 800g